The micro/nano metal pattern formation is a key step in the assembly of various devices. However, ex situ approaches of metal patterning limited their industrial applications due to the poor stability and dispersion of metal nanoparticles. The in situ electroless deposition after lithography patterning may be a better choice for avoiding the growth and aggregation of metal particles in the polymers.
owing to poor stability and dispersity of metal nanoparticles and lower resolution caused by the coffee ring effect and surface tension.
However, the local hyperthermal effects of the laser by direct photoradiation on the metal precursors in polymers can lead to the uncontrollability of metal growth and aggregation of particles, resulting in the irreversible loss of photoelectric properties. Hence, in situ electroless deposition after lithography patterning could be a better choice for avoiding the growth and aggregation of metal particles in the polymers.
Despite the fact that modified tannic acid has been applied in photoresist patterning, an in situ metallization method based on a tannic acid photoresist pattern has not been seen yet.
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